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k. gear designed for ion beam deposition or Actual physical vapor deposition of the multi-layer reflector for “EUV” masks;
4D001 “computer software”. Paragraph 4D001.a is revised by adding ECCN 4A906 into the exception parenthetical for 4D.
two. SFDR is decided directly from the specification desk or from your characterization plots of SFDR vs . frequency.
layout Updates: As A part of our ongoing effort and hard work to create FederalRegister.gov additional available and simpler to use we have enlarged the space accessible to the document content and moved all doc relevant information into the utility bar to the still left in the doc.
2. The resolution on the ADC is the amount of bits of the electronic output with the ADC that represents the calculated analog input. successful quantity of Bits (ENOB) is not really employed to find out the resolution of the ADC.
There exists a restricted considered export or deemed reexport exclusion from the license requirements During this paragraph (a)(5)(i) of this segment for the subsequent “application” or “technology” more info ECCNs Except for international persons whose most recent citizenship or lasting residency is really a desired destination specified in region team D:1 or D:five: ECCNs 2D910; 2E910; 3D001 (“software” for “EUV” masks and reticles in ECCN 3B001.q); 3D901 (for “computer software” for quantum objects in ECCNs 3A901.b and 3B904 and for scanning electron microscopes (SEM) in ECCN 3B903); 3D907 “program” created to extract “GDSII” or equal data; 3E001 (“engineering” for “EUV” masks and reticles in ECCN 3B001.
the transistor construction is not a “necessary” ingredient on the 3E001 or 3E002 controls. The items paragraph includes a Notice that states that “3E905 includes `approach recipes',” that happen to be described in a very technological Take note as “a set of disorders and parameters for a particular method phase.” BIS is incorporating a Take note on the relevant Regulate paragraph to assist marketplace in implementing the controls of this ECCN. The text in connected Management Notice 1 reads, “ECCN 3E905 applies to approach “technologies” solely with the “improvement” or “generation” of GAAFET constructions of built-in circuits at a semiconductor wafer manufacturing facility.
h. Multi-layer masks using a section shift layer not specified by 3B001.g and built ( print web page 72950) to be used by lithography products aquiring a gentle resource wavelength lower than 245 nm; Take note: 3B001.
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(Cat three) is actually a database file format for details exchange of built-in circuit artwork or integrated circuit structure artwork.
BIS also seeks community touch upon the considered export needs In this particular rule as well as opportunity impacts that a considered export Management would have if it was applied to the quantum objects and the final License in General Order no.
Paragraph 3A001.a.9 neural community built-in circuits is removed and reserved, due to addition of ECCN 3A090, which controls integrated circuits that may be useful for device Understanding of artificial intelligence methods, to the CCL.
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